Description
The Unversity of Ottawa is pleased to invite qualified proponents to submit a proposal for a Ambient And Non-Ambient Thin Film and Materials Research X-Ray Diffraction System.
General Description:
The requested x-ray diffraction system is a critical piece of infrastructure to perform XRD, and other X-Ray based measurements on thin film and polycrystalline materials, enabling the understanding of interactions between thin films of various functional materials crucial to emerging technologies, such as low cost smart labels,
affordable roll-up TV displays and flexible electronics integrated into currency or product labels to reduce counterfeit and fraud, to name a few. This equipment will provide measurement capabilities that will enable the researchers to effectively characterize their tailored organic/inorganic hybrid materials and engineered interfaces that otherwise would not be accessible to them. A comprehensive thin film and non-ambient materials X-Ray system capable of in-depth structural characterization of thin films and surfaces including phase analysis on films, film thickness and quality, crystallinity, crystal plane orientation, stress, and strain. High resolution XY mapping is also a critical feature which should be made possible via a high brilliance X-Ray source, the ability to produce a high intensity microbeam, and a high resolution XY sample stage. The instrument must also be able to perform most of these analyses at high and low temperatures, under a variety of atmospheric conditions (e.g. vacuum, air, inert gas, among others). Other applications of interest include the ability to use high energy (Mo or Ag) X-Rays to perform pair distribution function (PDF) analyses, and more efficient transmission measurements (at ambient and high temperature). Given the ambitious scope of capabilities, the University is open to proposals for either one comprehensive system or two instrumental platforms comprising an overall combined system that meets the requirements, to ensure the highest level of performance for each application, and to minimize downtime while switching between setups (thus maximizing accessibility for all techniques to all research projects).
Specifications listed in Appendix A – Technical Specifications Compliance Form of this RFP are the mandatory minimum requirements for the Ambient And Non-Ambient Thin Film and Materials Research X-Ray Diffraction System.
Mandatory Minimum Requirements for the Ambient And Non-Ambient Thin Film and Materials Research X-Ray Diffraction System:
1.0 Thin Film and Materials X-Ray Diffraction System
1.1 The system must consist of one or two fully functional, complete, and installed floor-standing instruments (collectively “the system”). Each instrument must completely house their own electronics, generator, and goniometer, and each must include a PC and monitor compatible with its instrument and software.
1.2 The system must be suitable for comprehensive thin film and surface structural characterization techniques including at least (“a” through “i” listed below):
1.2 (a) micro-diffraction (i.e. small or large sample XY mapping);
1.2 (b) grazing incidence diffraction (GID);
1.2 (c) in-plane grazing incidence diffraction (IP-GID);
1.2 (d) X-Ray reflectivity (XRR);
1.2 (e) high resolution X-Ray diffraction (HRXRD);
1.2 (f) reciprocal space mapping (RSM);
1.2 (g) pole figures;
1.2 (h) residual stress; and
1.2 (i) strain and texture analyses.
1.3 The system must be suitable for structural analyses of polycrystalline samples including at least (“a” through “c” listed below):
1.3 (a) phase identification;
1.3 (b) quantitative phase analysis; and
1.3 (c) microstructure analysis (i.e. crystallite size and microstrain).
1.4 (a) The system must be able to perform XY mapping, GID, and IP-GID measurements on thin film samples at controlled temperatures ranging from - 180 °C (or lower) to 1100 °C (or higher), under air, N2, Ar, and vacuum atmospheres.
1.4 (b) A liquid nitrogen dewar, vacuum pump, and all accessories required for this functionality (ref. 1.4 (a) above) must be included.
1.5 The system must include a “high brilliance” Cu K𝛼 X-Ray source. High brilliance means it is capable (when coupled with the appropriate optics if necessary) of delivering a higher brilliance than a 3 kW sealed-tube X-Ray source set up to produce an equivalently sized beam (i.e. higher flux density).
1.6 The system must be able to produce a microbeam with 100 𝜇m beam diameter or less.
1.7 At least 4 different collimators must be included to select beam size.
1.8 The system must include a vertical 𝜃-𝜃 goniometer (with a 2𝜃 measuring range of at least -3° to 160°) which has an additional axis for rotating the detector out of the vertical 𝜃-𝜃 plane (i.e. in a non-coplanar geometry) whereby in-plane measurements can be performed.
1.9 The system must be able to perform reflection mode experiments using a Bragg-Brentano geometry.
1.10 The system must be able to perform transmission mode experiments using a focusing beam geometry.
1.11 The system must include an Eulerian Cradle assembly with 5 motorized axes (𝜒, 𝜙, X, Y, Z) for mounting and positioning thin films.
1.12 The system must include a method of mounting and aligning samples prepared in capillaries, and must be able to perform transmission XRD measurements on these capillaries in focusing beam mode.
1.13 The capillary (ref 1.12 above) must be able to spin continuously during measurement.
1.14 The system must include a 2-D detector capable of operating in 2-D, 1-D, and 0-D mode.
1.15 The detector (ref 1.14 above) must have an active detector area of at least 2500 mm2, and pixels of size 100 𝜇m x 100 𝜇m or smaller.
2.0 Safety
2.1 The system and all options must be CSA approved or have an accepted CSAequivalent labelling that is listed at the following Electrical Safety Authority link: https://esasafe.com/electrical-products/recognized-certification-marks/
3.0 Installation and Warranty
3.1 Installation and training must be included.
3.2 Must include two (2) years warranty on parts and labor (including the standard warranty).
