JC 09-17-652 - Plasma Focused Ion Beam Microscope

1.1  Background and Purpose  

Focused Ion Beam microscopes are versatile characterization tools that perform a number of interesting functions. These are based on the use of electrostatic positioning of ions that sputter a targeted material. They are nanomachining tools. When coupled with a scanning electron microscope (SEM) column on the same instrument, many applications are possible. These include preparation of sample lamella and needles for TEM and atom-probe tomography. Other important applications include cross-sectioning of materials, direct-write machining and coordinated tomography. Recent models of these microscopes include a plasma-based ion source consisting of Xenon ions instead of traditional gallium ions. Xenon plasma sources enable much high beam currents, and hence milling rates, which allow the processing of larger volumes of material. Also included is the ability to control all aspects of the microscope in a customized manner through access to the Application Programming Interface (API) in order to optimize and automate data acquisition in this microscope.
 
1.2  Scope/Objective

McMaster University seeks to acquire a Plasma Focused Ion Beam (PFIB) Microscope that will provide proven results and analytical capabilities by demonstrating that the equipment will meet all specifications described in this Request for Proposals. The objective is to purchase a microscope that has a plasma ion source (using Xenon atoms), and a corresponding scanning electron column for analysis with a movable sample stage and in situ gas-based electron and ion beam deposition and etching. It must be fully programmable and customizable using the API.